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| Procedure Name | Description | Category | View Procedure Detail with Relevant Forms |
|---|---|---|---|
| View |
| HS Code | Description |
|---|---|
| 17713 | – – – Of resistance heated furnaces and ovens for the manufacture of semiconductor devices on semiconductor wafers; of inductance or dielectric furnaces and ovens for the manufacture of semiconductor devices on semiconductor wafers |
| 17714 | – – – Other |
| 17715 | – – Of machines and apparatus for the manufacture of flat panel displays: – – – Of apparatus for dry etching patterns on flat panel display substrates |
| 17716 | – – – Of apparatus for wet etching, developing, stripping or cleaning flat panel displays: – – – – Tool holders and self-opening dieheads; work holders; dividing heads and other special attachments for machine tools |
| 17717 | – – – Of apparatus for wet etching, developing, stripping or cleaning flat panel displays: – – – – Other |
| 17718 | – – – Of chemical vapour deposition apparatus for flat panel display production |
| 17719 | – – – Of spinners for coating photosensitive emulsions on flat panel display substrates |
| 17720 | – – – Of apparatus for physical deposition on flat panel display substrates |
| 17721 | – – – Other |
| 17722 | – – Of machines or apparatus specified in Note 9 ( C ) to this Chapter: – – – Of focused ion beam milling machine to produce or repair masks and reticles for patterns on semiconductor devices |
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